Progress in Materials Science 48 (2003) 57–170 Chemical Vapour Deposition (CVD) of films and coatings involve the chemical reactions of gaseous reactants on or near the vicinity of a heated substrate surface. This atomistic deposition method can provide highly pure materials with structural control at atomic or nanometer scale level. Moreover, it can produce single layer,...
Weinheim, Germany: Wiley-VCH Verlag GmbH & Co., 2015. — 484 p. — ISBN: 3527337997. The method of CVD (chemical vapor deposition) is a versatile technique to fabricate high-quality thin films and structured surfaces in the nanometer regime from the vapor phase. Already widely used for the deposition of inorganic materials in the semiconductor industry, CVD has become the method...
Weinheim; New York; Cambridge; Tokyo: VCH, 1994. — 562 p. — ISBN: 3-527-29071-0. High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the...
Materials Park, OH: ASM International, 2001. — vii, 481 p. — (Surface Engineering Series, v. 2). This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses...
Oxford: Elsevier Science, 1983. — 152 p. — ISBN: 978-0-12-674780-5, 0-12-674780-6, 9780323139151, 0323139159. Vacuum technology is advancing and expanding so rapidly that a major difficulty for most companies in the field is finding qualified technicians needed for expansion and as replacements. The only recourse for most companies is to hire capable, though untrained, people...
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