Park J.-H., Sudarshan T.S. Chemical Vapor Deposition

Materials Park, OH: ASM International, 2001. — vii, 481 p. — (Surface Engineering Series, v. 2).This handbook provides guidelines and practical information on the chemical vapor deposition (CVD) process for surface engineering design, product development, and manufacturing. The first of the 14 chapters discuss the basic principles of CVD thermodynamics and kinetics, stresses and mechanical stability of CVD thin films, and polarized electrochemical vapor deposition. Other topics include the chemical vapor deposition of polymers and nickel, CVD diamond films in tribological applications, CVD films for electrical insulation, and the heat treatment of CVD-coated tool steels.Preface vii
Introduction to Chemical Vapor Deposition (CVD)
Basic Principles of CVD Thermodynamics and Kinetics
Stresses and Mechanical Stability of CVD Thin Films
Combustion Chemical Vapor Deposition (CCVD)
Polarized Electrochemical Vapor Deposition
Chemical Vapor Infiltration: Optimization of Processing Conditions
Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba,Sr) TiO₃ Thin Films for Dynamic Random Access Memory Applications
Chemical Vapor Deposition of Polymers: Principles, Materials, and Applications
CVD of Metals: The Case of Nickel
CVD Diamond, Diamond-Like Carbon, and Carbonitride Coatings
CVD Diamond Films in Tribological Applications
CVD Films for Electrical Insulation
CVD Films for Corrosion Protection Coatings
Heat treatment of CVD-Coated Tool Steels